Method for preparing semiconductor device

ABSTRACT

The present disclosure provides a method for preparing a semiconductor device. The semiconductor device includes a substrate, a first region, a second region, a third region, a fourth region, a fifth region and a sixth region. The first type region is disposed on the substrate and has a ring structure. The second type region is disposed on the substrate and disposed in the center of the first type region. A plurality of second well regions are formed in the first region, the second region, the fourth region, the fifth region and the sixth region. A plurality of second well regions in the first region, the second region, the fourth region, the fifth region and the sixth region. The first well region, the second well region, the first type region and the second type region are formed by ion implantation.

CROSS-REFERENCE TO RELATED APPLICATION

This application is a divisional application of U.S. Non-Provisionalapplication Ser. No. 16/459,017 and claims the benefit of U.S.Provisional Patent Application No. 62/769,823 filed Nov. 20, 2018, whichis incorporated herein by reference in its entirety.

TECHNICAL FIELD

The present disclosure relates to a method for preparing a semiconductordevice, and more particularly to a method for preparing a semiconductordevice for testing leakage current.

DISCUSSION OF THE BACKGROUND

Ion implantation is one way of doping semiconductors. The ions to beadded are first ionized to enhance the energy or kinetic energy of theimpurities. Next, an electric field is used to accelerate the velocityof the ions and a magnetic field changes the direction of motion.Impurities are driven directly into the germanium wafer, allowingimpurity atoms to diffuse into the wafer. An ideal implant region issought in order to implant ions into as much of the wafer as possible.However, due to the loading effect, corners of the implant region cannotbe implanted with ions.

This Discussion of the Background section is for background informationonly. The statements in this Discussion of the Background are not anadmission that the subject matter disclosed in this section constitutesa prior art to the present disclosure, and no part of this section maybe used as an admission that any part of this application, includingthis Discussion of the Background section, constitutes prior art to thepresent disclosure.

SUMMARY

One aspect of the present disclosure provides a semiconductor deviceincluding a substrate, a first type region, a second type region and anisolation structure. The first type region is disposed on the substrateand has a ring structure. The second type region is disposed on thesubstrate and disposed in the center of the first type region. Theisolation structure is disposed between the first type region and thesecond type region, wherein the second type region has a square shapeand includes a plurality of corners.

In some embodiments, the plurality of corners further comprises aplurality of sub-block structures.

In some embodiments, the first type region is a P-type structure, andthe second type region is an N-type structure.

In some embodiments, the semiconductor device is disposed on a scribeline of a wafer.

Another aspect of the present disclosure provides a semiconductor devicecomprising: a substrate, a first type region, a second type region andan isolation structure. The first type region is disposed on thesubstrate and has a line structure, and the first type region furtherincludes a plurality of turns and a plurality of U-shaped structures.The second type region is disposed on the substrate, and comprises aplurality of vertical structures and a plurality of horizontalstructures, the horizontal structures extending into the U-shapedstructure. The isolation structure is disposed between the first taperegion and the second type region, wherein the second type region has asquare shape and includes a plurality of corners.

In some embodiments, the plurality of corners comprise a plurality ofsub-block structures.

In some embodiments, the first type region is a P-type structure, andthe second type region is an N-type structure.

In some embodiments, the semiconductor device is disposed on a scribeline of a wafer.

Another aspect of the present disclosure provides a method for preparingsemiconductor devices, the method comprising: providing a substrate,wherein the substrate comprises a first region, a second region and athird region, wherein the second region is disposed between the firstregion and the third region; forming a plurality of photoresists in thefirst region and the third region; forming a groove in the third region;removing the photoresist of the first region; forming a second wellregion in the first region; forming a photoresist in the first region,removing the photoresist of the third region, and forming a first wellregion in the second region and the third region; removing thephotoresist of the first region; forming an isolation structure in thegroove; forming a plurality of photoresists in the second region and thethird region, and forming a second type region in the first region;removing the photoresist of the third region, forming a photoresist inthe first region, and forming a first type region in the third region;and removing the photoresists of the first region and the second region,wherein the first well region, the second well region, the first typeregion and the second type region are formed by ion implantation.

In some embodiments, the method further comprises: forming an isolationstructure layer on a surface of the substrate, the isolation structurelayer covering the surface of the substrate; and removing the isolationstructure layer along the surface of the substrate.

In some embodiments, the substrate is a P-type substrate.

In some embodiments, the first type region is a P-type structure, thesecond type region is an N-type structure, the first well region is aP-type well and the second well region is an N-type well.

Another aspect of the present disclosure provides a method for preparinga semiconductor device, the method comprising: providing a substrate,wherein the substrate includes a first region, a second region, a thirdregion, a fourth region, a fifth region and a sixth region, the secondregion is disposed between the first region and the third region, thefourth region is disposed between the third region and the fifth region,and the fifth region is disposed between the fourth region and the sixthregion; forming a plurality of photoresists in the first region, thethird region and the fifth region; forming a plurality of grooves in thesecond region, the fourth region and the sixth region; removing thephotoresists of the first region and the fifth region and forming aplurality of second well regions in the first region, the second region,the fourth region, the fifth region and the sixth region; removing thephotoresist of the third region, forming a photoresist in the firstregion, the fifth region and the sixth region, and forming a first wellregion in the second region, the third region and the fourth region;removing the photoresists of the first region, the fifth region and thesixth region; forming a plurality of isolation structures in the groovesof the second region, the fourth region, and the sixth region; forming aphotoresist in the second region, the third region, and the fourthregion, and forming a plurality of second type regions in the firstregion and the fifth region; removing the photoresist of the thirdregion, forming a photoresist in the first region and the fifth region,and forming a plurality of first type regions in the third region; andremoving the photoresists of the first region, the second region, thefourth region and the fifth region; wherein the first well region, thesecond well region, the first type region and the second type region areformed by ion implantation.

In some embodiments, the method further comprises: forming an isolationstructure layer on a surface of the substrate, so that the isolationstructure layer covers the surface of the substrate; and removing theisolation structure layer from the surface of the substrate.

In some embodiments, the substrate is a P-type substrate.

In some embodiments, the first type region is a P-type structure, thesecond type region is an N-type structure, the first well region is aP-type well, and the second well region is an N-type well.

The foregoing has outlined rather broadly the features and technicaladvantages of the present disclosure in order that the detaileddescription of the disclosure that follows may be better understood.Additional features and technical advantages of the disclosure aredescribed hereinafter, and form the subject of the claims of thedisclosure. It should be appreciated by those skilled in the art thatthe concepts and specific embodiments disclosed may be utilized as abasis for modifying or designing other structures, or processes, forcarrying out the purposes of the present disclosure. It should also berealized by those skilled in the art that such equivalent constructionsdo not depart from the spirit or scope of the disclosure as set forth inthe appended claims.

BRIEF DESCRIPTION OF THE DRAWINGS

A more complete understanding of the present disclosure may be derivedby referring to the detailed description and claims. The disclosureshould be understood to be connected to the figures' reference numbers,which refer to similar elements throughout the description.

FIG. 1A and FIG. 1B are schematic diagrams showing a comparativesemiconductor device having a conventional PN junction.

FIG. 2A and FIG. 2B are schematic diagrams showing a structure fortesting leakage current.

FIG. 3A and FIG. 3B are schematic diagrams showing a semiconductordevice implanted under ideal conditions.

FIG. 3C and FIG. 3D are schematic diagrams showing a semiconductordevice implanted under actual conditions.

FIG. 3E is a schematic diagram illustrating a semiconductor device inaccordance with some embodiments of the present disclosure.

FIG. 4A and FIG. 4B are schematic diagrams illustrating anothersemiconductor device in accordance with some embodiments of the presentdisclosure.

FIG. 5 is a schematic view showing the arrangement of a semiconductordevice in accordance with some embodiments of the present disclosure.

FIG. 6A through FIG. 6K illustrate a method of preparing thesemiconductor device shown in FIG. 3E in accordance with someembodiments of the present disclosure.

FIG. 7A through FIG. 7K illustrate a method of preparing thesemiconductor device shown in FIG. 4A in accordance with someembodiments of the present disclosure.

DETAILED DESCRIPTION

Embodiments, or examples, of the disclosure illustrated in the drawingsare now described using specific language. It shall be understood thatno limitation of the scope of the disclosure is hereby intended. Anyalteration or modification of the described embodiments, and any furtherapplications of principles described in this document, are to beconsidered as normally occurring to one of ordinary skill in the art towhich the disclosure relates, Reference numerals may be repeatedthroughout the embodiments, but this does not necessarily mean thatfeature(s) of one embodiment apply to another embodiment, even if theyshare the same reference numeral.

It shall be understood that, although the terms first, second, third,etc. may be used herein to describe various elements, components,regions, layers or sections, these elements, components, regions, layersor sections are not limited by these terms. Rather, these terms aremerely used to distinguish one element, component, region, layer orsection from another region, layer or section. Thus, a first element,component, region, layer or section discussed below could be termed asecond element, component, region, layer or section without departingfrom the teachings of the present inventive concept.

The terminology used herein is for the purpose of describing particularexample embodiments only and is not intended to be limiting to thepresent inventive concept. As used herein, the singular forms “a,” “an”and “the” are intended to include the plural forms as well, unless thecontext clearly indicates otherwise. It shall be further understood thatthe terms “comprises” and “comprising,” when used in this specification,point out the presence of stated features, integers, steps, operations,elements, or components, but do not preclude the presence or addition ofone or more other features, integers, steps, operations, elements,components, or groups thereof.

FIG. 1A and FIG. 1B are schematic diagrams showing a comparativesemiconductor device having a conventional PN junction.

Referring to FIG. 1A and FIG. 1B, the conventional PN junction implantsions into the P-region 10 to form a P-type well 12 (PW).

As shown in FIG. 1A, an ideal implant region is sought in order toimplant ions into as much of the P-region 10 as possible. However, dueto the loading effect, the corners 13 of the P-region 10 cannot becompletely implanted with ions, such that the formed P-type well 12 isslightly smaller than the original P-region 10, particularly at thecorners 13. As can be seen in FIG. 1B, the influence of the loadingeffect is more pronounced in the formation of the P-type well 12 and theP-region 10 of a smaller device.

FIG. 2A and FIG. 2B are schematic diagrams showing a structure fortesting leakage current. Referring to FIG. 2A and FIG. 2B, the N-typestructure 11 is implanted, and the N-type well 11″ (NW) cannotcompletely cover the entire N-region 11′ due to the loading effect,particularly near the corner 13. FIG. 2B is a cross-sectional view alongline AA in FIG. 2A. Due to the influence of the loading effect, theformed N-type well 11″ is smaller than the N-region 11′, resulting incontact between the P-type well 12 and the N-type structure 11, which inturn generates leakage current. This phenomenon can be used as a basisfor checking leakage current of the overall device. However, with theconventional design, the contact area between the P-type well 12 and theN-type structure 11 is small, resulting in the leakage current being toosmall for easy detection.

Therefore, there is a need for an improved method of detecting leakagecurrent.

FIG. 3A and FIG. 3B are schematic diagrams of a semiconductor deviceimplanted under ideal conditions. The semiconductor device 100 includesa substrate 150, a first type region 120 and a second type region 110.In some embodiments, the first type region 120 and the second typeregion 110 are a P-type structure and an N-type structure, respectively.However, the disclosure is not limited thereto, and those skilled in theart should know that the first type region 120 can also be an N-typestructure, and the second type region can also be a P-type structure,according to design requirements. For convenience of description, thefollowing embodiments are unified in that the first type region 120 is aP-type structure, and the second type region 110 is an N-type structure.

In some embodiments, the P-type structure 120 and the N-type structure110 are disposed on the substrate 150, wherein the P-type structure 120is a ring-shaped structure, and the N-type structure 110 is disposed atthe center of the P-type structure 120. That is, the P-type structure120 surrounds the N-type structure 110, and the N-type structure 110assumes a square structure and includes a plurality of corners. There isalso an isolation structure 140 between the P-type structure 120 and theN-type structure 110. The isolation structure 140 refers to a shallowtrench isolation (STI).

The semiconductor device 100 includes an implanted region 130 that isslightly larger than the N-type structure 110 and is intended to definea second well region 110′. After the ion implantation, a portion of thesemiconductor device 100 is as shown in FIG. 3B, which is across-sectional view taken along line A-A of FIG. 3A. The P-typestructure 120 and the N-type structure 110 facilitate the formation ofthe second well region 110′ and the first well region 120′. Thedifferent is states of the semiconductor device 100 shown in FIGS. 3Aand 3B indicate the result of an ion implantation performed under idealconditions.

In some embodiments, the second well region 110′ and the first wellregion 120′ are an N-type well and a P-type well, respectively. However,the disclosure is not limited thereto, and those skilled in the artshould know that the first well region 120′ may also be an N-type well,and the second well region 110′ may also be a P-type well, according todesign requirements. For convenience of explanation, the followingembodiments are unified in that the well region 120′ is a P-type welland the second well region 110′ is an N-type well.

FIG. 3C and FIG. 3D are schematic diagrams of a semiconductor device 100implanted under actual conditions. As shown in FIG. 3C, the actualimplanted region 130′ is rounded at the corners of the N-type structure110 due to the loading effect. Therefore, as shown in thecross-sectional view of FIG. 3D, the area of the N-type well region 110′below the N-type structure 110 is smaller, and the area of the P-typewell region 120′ is greater, and the P-type well region 120′ is incontact with the N-type structure 110. As a result, the leakage currentis more easily detected.

The loading effect is most likely to influence the ion implantation atthe corners of the implanted device. This effect is illustrated in FIG.3E, which shows the semiconductor device 100 in accordance with someembodiments of the present disclosure. In one embodiment, the corners ofthe N-type structure 110 are provided with a plurality of sub-cornerstructures 111. The arrangement of the sub-corner structure 111 causesthe N-type structure to include more corners, and the contact areabetween the P-type well region 120′ and the N-type structure 110 isenlarged, thereby causing the leakage current phenomenon to be morereadily detected.

FIG. 4A and FIG. 4B illustrate another semiconductor device 200 inaccordance with some embodiments of the present disclosure. In someembodiments, the semiconductor device 200 includes a substrate 250, aP-type structure 220, and an N-type structure 210. The main differencebetween this embodiment and the embodiment described with respect toFIGS. 3C to 3E is that the shapes of the P-type structure 220 and theN-type structure 210 are changed. In the present embodiment, the P-typestructure 220 is disposed on the substrate 250, and the P-type structure220 assumes a linear structure while including a plurality of transitionpoints to the U-shaped structure; that is, the P-type structure 220presents a winding linear structure that changes direction multipletimes.

The N-type structure 210 is disposed on the substrate 250, and theN-type structure 210 includes a plurality of vertical structures 210 aand horizontal structures 210 b. The plurality of vertical structures210 a and the plurality of horizontal structures 210 b are connected toeach other such that the N-type structure 210 exhibits a plurality ofT-shaped structures connected to each other. The horizontal structure210 b is a U-shaped structure that protrudes into the P-type structure220. An isolation structure 240 is disposed between the P-type structure220 and the N-type structure 210. In the current embodiment, thephenomenon of the loading effect occurs mostly in the portions where thestructure exhibits a bend or turn; therefore, as shown in FIG. 4A, theP-type structure 220 and the N-type structure 210 disposed at theperiphery are formed with additional bends added to increase the turningportion, thereby further increasing the area where loading effects aremore likely to occur.

FIG. 4B is a cross-sectional view of the semiconductor device 200 afterion implantation of the implanted region 230. After implantation, theN-type structure 210 and the P-type structure 220 form an N-type wellregion 210′ and a P-type well region 220′, respectively. Due to theincomplete implantation, the area of the P-type well region 220′ isenlarged, and the P-type well region 220′ is brought into contact withthe N-type structure 210. When the P-type well region 220′ is in contactwith the N-type structure 210, leakage current is generated, therebyimproving the sensitivity of leakage detection.

FIG. 5 is a schematic diagram of an arrangement of semiconductor devicesin accordance with one embodiment of the present disclosure. In thisembodiment, a variety of microstructure devices 21 are disposed on thewafer 20, and the semiconductor device 100 of the present disclosure isdisposed on a scribe line 22 of the base wafer 20, The semiconductordevice 100 is disposed on the scribe line 22 between the microstructuredevices 21.

The semiconductor device 100 is used for testing purposes to measure theleakage current condition of other microstructure devices 21 on thewafer 20. After the test is completed, the semiconductor device 100 isremoved when the wafer 20 is cut, so the semiconductor device 100 doesnot affect the other microstructure devices 21 on the wafer 20. That is,the main purpose of the semiconductor device 100 is to detect theleakage current phenomenon of the entire wafer 20. Moreover, since thescribe line 22 is designed as a portion to be cut off, and the wafertesting device 100 is disposed on the scribe line 22, there is no needto set the semiconductor device 100 at other locations of the wafer 20,thereby saving material usage of the wafer, and the semiconductor device100 does not occupy the space of other microstructure devices 21.

FIG. 6A to FIG. 6K illustrate a method of preparing the semiconductordevice 100 shown in FIG. 3E in accordance with some embodiments of thepresent disclosure. First, referring to FIG. 6A, in some embodiments, asubstrate 150 is provided. The substrate 150 includes a first region151, a second region 152 and a third region 153. In some embodiments,the second region 152 is disposed between the first region 151 and thethird region 153. In the present embodiment, the substrate 150 is aP-type substrate.

Next, referring to FIG. 6B, in some embodiments, a plurality ofphotoresists 101 are formed in the first region 151 and the third region153, wherein the photoresists (PR) protect the PR-covered regions, sothat the PR-covered regions are not affected by subsequent etching orion implantation.

Next, referring to FIG. 6C, a groove 140′ is formed on the substrate150, within the second region 152. In the present embodiment, the groove140′ is formed by an etch-through technique, while the first region 151and the third region 153 are covered with the photoresist 101, so thefirst region 151 and the third region 153 of the substrate 150 are notaffected by the etch-through technique.

Referring to FIG. 6D, after the groove 140′ is formed, the photoresist101 in the first region 151 is removed, and an N-type well region 110′is formed on the substrate 150, within the first region 151. Next,referring to FIG. 6E, in some embodiments, a photoresist 101 is formedin the first region 151, that is, over the N-type well region 110′,while the photoresist 101 of the third region 153 is removed, and aP-type well region 120′ is formed in the second region 152 and the thirdregion 153. Significantly, when the P-type well region 120′ is formed,the area of the N-type well region 110′ is reduced due to the loadingeffect, so that a portion of the first region 151 is included in theP-type well region 120′.

The above-described steps use ion implantation techniques to form anN-type well region 110′ and a P-type well region 120′. Therefore, whenthe substrate 150 is subjected to ion implantation, the substrate 150 isconverted into the N-type well region 110′ or the P-type well region120′ due to the difference in amount of implanted ions. Portions coveredby the photoresist 101 are not affected by the implantation.

Referring to FIG. 6F, the photoresists 101 of the first region 151 areremoved. Next, referring to FIG. 6G, an isolation structure layer 140″is formed on the surface of the substrate 150, and the isolationstructure layer 140″ fills the groove 140′ and covers the surface of thesubstrate 150. Thereafter, referring to FIG. 6H, the isolation structurelayer 140″ is removed from the surface of the substrate 150, and anisolation structure 140 is further formed in the groove 140′. In thisembodiment, the isolation structure layer 140″ is removed by chemicalmechanical planarization (CMP).

Referring to FIG. 6I, after the isolation structure 140 is formed, aphotoresist 101 is formed in the second region 152 and the third region153, and an N-type structure 110 is formed in the first region 151.Next, referring to FIG. 6I, the photoresist 101 in the third region 153is removed, a photoresist 101 is formed in the first region 151, and aP-type structure 120 is formed in the third region 153.

In the steps described above, the N-type structure 110 and the P-typestructure 120 are formed using ion implantation techniques. Therefore,when the N-type well region 110′ and the P-type well region 120′ areimplanted, they are converted into the N-type structure 110 or theP-type structure 120 due to the difference in implanted ions. Theportions covered by the photoresist 101 are not affected by theimplantation.

Subsequently, referring to FIG. 6K, the photoresists 101 of the firstregion 151 and the second region 152 are removed, such that thepreparation of the semiconductor device 100 is completed, and thesemiconductor device 100 shown in FIG. 3E is produced in accordance withsome embodiments of the present disclosure. Moreover, due to theinfluence of the loading effect, the N-type structure 110 is broughtinto contact with the P-type well region 120′, which causes a leakagecurrent, thereby improving the sensitivity of leakage detection. In someembodiments, as shown in FIG. 5 , the wafer test component 100 is formedon the scribe line 22 of the wafer 20, the semiconductor device 100 canbe used to obtain a measurement of the leakage current condition of thewafer 20, and after the test is completed, the semiconductor device 100can be removed without cutting the other microstructure devices 21 whenthe wafer 20 is cut.

FIG. 7A to FIG. 7K illustrate a method of preparing anothersemiconductor device 200 in accordance with some embodiments of thepresent disclosure, First, referring to FIG. 7A, a substrate 250 isprovided. The substrate 250 includes a first region 251, a second region252, a third region 253, a fourth region 254, a fifth region 255, and asixth region 256, The second region 252 is disposed between the firstregion 251 and the third region 253, and the fourth region 254 isdisposed between the third region 253 and the fifth region 255. In thepresent embodiment, the substrate 250 is a P-type substrate.

Next, referring to FIG. 7B, a plurality of photoresists 202 are formedin the first region 251, the third region 253, and the fifth region 255.Thereafter, referring to FIG. 7C, a plurality of grooves 240′ are formedon the substrate 250. In some embodiments, the grooves 240′ are formedby an etch-through technique, and the first region 251, the third region253, and the fifth region 255 are covered with the photoresist 201, suchthat the portions of the substrate 250 in the first region 251, thethird region 253 and the fifth region 255 are unaffected by theetch-through technique.

After the grooves 240′ are formed, referring to FIG. 7D, thephotoresists 202 of the first region 251 and the filth region 255 areremoved, and a plurality of N-type well regions 210′ are formed on thesubstrate 250 in the first region 251, the second region 252, the fourthregion 254, the fifth region 255 and the sixth region 256.

Next, referring to FIG. 7E, the photoresist 202 of the third region 253is removed, a plurality of photoresists 202 are formed in the firstregion 251, the fifth region 255, and the sixth region 256, and a P-typewell region 220′ is formed in the second region 252, the third region253 and the fourth region 254 of the substrate 250, When the P-type wellregion 220′ is formed, the area of the N-type well region 210′ isreduced due to the loading effect, such that portions of the firstregion 251 and the fifth region 255 are included in the P-type wellregion 220′. Next, referring to FIG. 7F, the photoresists 202 of thefirst region 251, the fifth region 255, and the sixth region 256 of thesubstrate 250 are removed.

In the steps of forming the plurality of N-type well regions 210′ andthe P-type well region 220′ in the present embodiment, the N-type wellregions 210′ and the P-type well region 220′ are formed using ionimplantation techniques. When the substrate 250 is subjected to ionimplantation, the substrate 250 is converted into the N-type well region210′ or the P-type well region 220° due to the difference in implantedions. The portions covered by the photoresist 201 are not affected bythe implantation.

Next, referring to FIG. 7G, an isolation structure layer 240″ is formedon the surface of the substrate 250, wherein the isolation structurelayer 240″ covers the surface of the substrate 250 and fills theplurality of grooves 240′. Thereafter, referring to FIG. 7H, theisolation structure layer 240″ is removed from the surface of thesubstrate 250, and a plurality of isolation structures 240 are formed inthe grooves 240′ of the second region 252, the fourth region 254, andthe sixth region 256. In some embodiments, the isolation structure layer240″ can be removed by chemical mechanical planarization.

After the isolation structures 240 are formed, referring to FIG. 7I, aphotoresist 202 is formed in the second region 252, the third region253, and the fourth region 254, and a plurality of N-type structures 210are formed on the N-type well regions 210′ of the first region 251 andthe fifth region 255. Next, referring to FIG. 7J, the photoresist 202 inthe third region 253 is removed, photoresists 202 are formed on thesubstrate 250 in the first region 251, the fifth region 255, and thesixth region 256, and a P-type structure 220 is formed on the P-typewell region 220′ in the third region 253.

In the steps of forming the plurality of N-type structures 210 and theP-type structure 220, the N-type structures 210 and the P-type structureare formed using ion implantation techniques. When the N-type wellregions 210′ and the P-type well region 220′ are implanted, they areconverted into the N-type structures 210 and the P-type structure 220due to the difference in implanted ions. The portions covered by thephotoresist 201 are not affected by the implantation.

Subsequently, the photoresists 202 of the first region 251, the secondregion 252, the fourth region 254, the fifth region 255 and the sixthregion 256 of the substrate 250 are removed, such that the preparing ofthe semiconductor device 200 is completed, and the semiconductor device200 shown in FIG. 4A is produced in accordance with some embodiments ofthe present disclosure. As shown in FIG. 7K, the semiconductor device200 of the present embodiment has a reduced area of the N-type wellregion 210′ due to the loading effect, such that the P-type well region220′ is in contact with the N-type structure 210, thereby generating aleakage current phenomenon. In some embodiments, the wafer testcomponent 200 can be disposed on the scribe line 22 of the wafer 20 tomeasure the leakage of the wafer 20, and the semiconductor device 200can be directly cut off after the measurement, as in the previousembodiment. The area of use of the wafer 20 is not wasted.

The semiconductor device 100 of the present disclosure is configured sothat the shape of the P-type structure and the N-type structure includesmore corners and turns than the conventional design. In addition, thecorners and turns in the target device of the ion implantation cannot becompletely implanted due to the loading effect, which thereby generatesleakage current characteristics, and the semiconductor device 100 istherefore able to be used for testing the leakage current condition ofthe entire wafer 20. Furthermore, the presence of more corners or moreturns improves the ability of the device to detect a leakage current.The semiconductor device 100 is further disposed on the scribe line 22of the wafer 20. The wafer dicing is performed directly after theleakage current test, such that the semiconductor device 100 is directlycut off so as not to affect other microstructure devices 21 on the wafer20, saving material use and production costs.

One aspect of the present disclosure provides a semiconductor deviceincluding a substrate, a first type region, a second type region and anisolation structure. The first type region is disposed on the substrateand has a ring structure. The second type region is disposed on thesubstrate and disposed in the center of the first type region. Theisolation structure is disposed between the first type region and thesecond type region, wherein the second type region has a square shapeand includes a plurality of corners.

Another aspect of the present disclosure provides a semiconductor devicecomprising: a substrate, a first type region, a second type region andan isolation structure. The first type region is disposed on thesubstrate and has a line structure, and the first type region furtherincludes a plurality of turns and a plurality of U-shaped structures.The second type region is disposed on the substrate and comprises aplurality of vertical structures and a plurality of horizontalstructures, wherein the horizontal structures extend into the U-shapedstructure. The isolation structure is disposed between the first typeregion and the second type region, wherein the second type region has asquare shape and includes a plurality of corners.

Another aspect of the present disclosure provides a method for preparingsemiconductor devices, comprising: providing a substrate, wherein thesubstrate comprises a first region, a second region and a third region,wherein the second region is disposed between the first region and thethird region; forming a plurality of photoresists in the first regionand the third region; forming a groove in the third region; removing thephotoresist of the first region, and forming a second well region in thefirst region; forming a photoresist in the first region, removing thephotoresist of the third region, and forming a first well region in thesecond region and the third region; removing the photoresist of thefirst region; forming an isolation structure in the groove; forming aphotoresist in the second region and the third region, and forming asecond type region in the first region; removing the photoresist of thethird region, forming a photoresist in the first region, and forming afirst type region in the third region; and removing the photoresists ofthe first region and the second region; wherein the first well region,the second well region, the first type region and the second type regionare formed by ion implantation.

Another aspect of the present disclosure provides a method for preparingsemiconductor devices, comprising: providing a substrate, wherein thesubstrate includes a first region, a second region, a third region, afourth region, a fifth region and a sixth region, wherein the secondregion is disposed between the first region and the third region, thefourth region is disposed between the third region and the fifth region,and the fifth region is disposed between the fourth region and the sixthregion; forming a plurality of photoresists in the first region, thethird region and the fifth region; forming a plurality of grooves in thesecond region, the fourth region and the sixth region; removing thephotoresist of the first region and the fifth region and forming aplurality of second well regions in the first region, the second region,the fourth region, the fifth region and the sixth region; removing thephotoresist of the third region, forming a photoresist in the firstregion, the fifth region and the sixth region, and forming a first wellregion in the second region, the third region and the fourth region;removing the photoresists of the first region, the fifth region and thesixth region; forming a plurality of isolation structures in the groovesof the second region, the fourth region, and the sixth region; forming aplurality of photoresists in the second region, the third region, andthe fourth region, and forming a plurality of second type regions in thefirst region and the fifth region; removing the photoresist of the thirdregion, forming a plurality of photoresists in the first region and thefifth region, and forming a plurality of first type regions in the thirdregion; and removing the photoresists of the first region, the secondregion, the fourth region and the fifth region; wherein the first wellregion, the second well region, the first type region and the secondtype region are formed by ion implantation.

The scope of the present application is not intended to be limited tothe particular embodiments of the process, machine, manufacture, andcomposition of matter, means, methods and steps described in thespecification. As one of ordinary skill in the art will readilyappreciate from the present disclosure, processes, machines,manufacture, compositions of matter, means, methods, or steps, presentlyexisting or later to be developed, that perform substantially the samefunction or achieve substantially the same result as the correspondingembodiments described herein may be utilized according to the presentdisclosure. Accordingly, the appended claims are intended to includewithin their scope such processes, machines, manufacture, compositionsof matter, means, methods, or steps.

What is claimed is:
 1. A method for preparing semiconductor devices,comprising: providing a substrate, wherein the substrate includes afirst region, a second region, a third region, a fourth region, a fifthregion and a sixth region, wherein the second region is disposed betweenthe first region and the third region, the fourth region is disposedbetween the third region and the fifth region, and the fifth region isdisposed between the fourth region and the sixth region; forming aplurality of photoresists in the first region, the third region and thefifth region; forming a plurality of grooves in the second region, thefourth region and the sixth region; removing the photoresists of thefirst region and the fifth region and forming a plurality of second wellregions in the first region, the second region, the fourth region, thefifth region and the sixth region; removing the photoresist of the thirdregion, forming the photoresist in the first region, the fifth regionand the sixth region, and forming a first well region in the secondregion, the third region and the fourth region; removing thephotoresists of the first region, the fifth region, and the sixthregion; forming a plurality of isolation structures in the grooves ofthe second region, the fourth region, and the sixth region; forming aplurality of photoresists in the second region, the third region, andthe fourth region, and forming a plurality of second type regions in thefirst region and the fifth region; removing the photoresist of the thirdregion, forming a plurality of photoresists in the first region and thefifth region, and forming a plurality of first type regions in the thirdregion; and removing the photoresists of the first region, the second,the fourth region and the fifth region; wherein the first well region,the second well region, the first type region and the second type regionare formed by ion implantation.
 2. The method of claim 1, furthercomprising: forming an isolation structure layer on a surface of thesubstrate, wherein the isolation structure layer covers the surface ofthe substrate; and removing the isolation structure layer from thesurface of the substrate.
 3. The method of claim 1, wherein thesubstrate is a P-type substrate.
 4. The method of claim 1, wherein thefirst type region is a P-type structure, the second type region is anN-type structure, the first well region is a P-type well, and the secondwell region is an N-type well.